Skip to content

Commit

Permalink
Update XPS_experiment.md
Browse files Browse the repository at this point in the history
  • Loading branch information
MPrenzel authored Feb 7, 2024
1 parent 22373a8 commit f4f79d6
Showing 1 changed file with 23 additions and 41 deletions.
64 changes: 23 additions & 41 deletions dev/diagnostics/spectroscopy/XPS/XPS_experiment.md
Original file line number Diff line number Diff line change
@@ -1,44 +1,26 @@
|Id | Key | Title |Unit | Description | Type | Occ | Allowed values |
|---- | ------------------- | ----------------------| ---- | ----------------------------------------------------------| ------- | -------- | ------------- |
| 1 | Experiment | Experiment description| | Description of the experiment| | 1| |
| 1.1 | AnodeVoltageValue | Anode voltage | | Voltage at the anode e.g. 15 keV | number | 1 ||
| 1.2 | BeamDiameterValue | XPS beam diameter | µm | Beam diameter of the XPS measurement | number | 1 | |
| 1.3 | Tilt | Tilt angle | ° | Tilt angle of measurement | number | 1 | |
| 1.4 | PressureValue | XPS pressure | | Pressure during measurements | string | 1 | |
| 1.5 | Holder | Sample holder | | Which sample holder is used | string | 1 | |
| 6 | Sample | Sample description| | Description of the samples| | 1-n | |
| 6.1 | SampleType | Sample type | | Homogeneous; gas; amorphous; inorganic material; powder | string |1| |
| 6.2 | SampleID | Sample name | | Number or sample name | string | 1 | |
| 6.3 | FileName | File name | | File name of this measurement | string | 1 | |
| 6.4 | ReceivedCondition | As received condition | | Condition how the sample was received to the XPS chamber (expsoure time) | string | 1 | |
| 6.5 | History | History of sample | | Sample history of previous measurements | string | 0 | |
| 6.6 | SafetyInfo | Safety information | | Official sample information | string | 0 | |
| 6.7 | SampleMounting | Mounting of the sample | | Mounting of the sample | string | 1 | |
| 6.8 | TemperatureSample | Sample temperature | K | Temperature of the sample during measurement | number | 1 | |
| 6.9 | NeutralizeType | Neutralization | | Neutralization information during measurement | string | 1 | |
| 6.10 | NeutralizeEnergy | Energy of neutralization | W | Energy of neutralization | number | 1 | |
| 6.11 | NeutralizeCurrent | Current neutralize mA| | Neutralization current | string | 1 | |
| 6.12 | RepeatNumber | Repeats of measurement | | Number of repeats of the whole measurement setting | number | 0 | |
| 7 | Peak | Peak description| | Description of the peaks | | 1-n | |
| 7.1 | Sample | Sample | | Name of the measured sample (reffering to ID/name of sample from the top) | string | 1-n | |
| 7.2 | PeakName | XPS peak name | | Name of the measured peak including the orbital (e.g. O1s, SURV) | string | 1 | |
| 7.3 | PassEnergy | ValuePass energy | eV | Value of pass energy for FAT | number | 1 | |
| 7.4 | RetardationValue | Retardation ratio | | Retardation ratio (eV) | number | 1 | |
| 7.5 | LowerBE | XPS lower binding energy | eV | Lower Binding energy of measurement | number | 1 | |
| 7.6 | UpperBE | XPS upper binding energy | eV | Upper Binding energy of measurement | number | 1 | |
| 7.7 | AcquisitionTime | Acquisition time | | Total signal accumulation time | number | 1 | |
| 7.8 | StepWidth | XPS step width | eV | Step width of detailed XPS measurement | number | 1 | |
| 7.9 | ScanNumber | Number of scans | | Number of scans for one peak | number | 1 | |
| 7.10 | SampleComment | Comment | | Indicate with any comment specific information about the sample | string | 1 | |
| 8 | Sputtering | Sputtering description| | Description of the sputtering | | 0-n | |
|8.1|SampleSputt|Sample for sputtering||Indicate which sample is sputtered||1||
| 8.2 | SputterIonName | Gas name | |Name of the gas used for sputtering e.g. Ar, He | string | 1 | |
| 8.3 | Cluster | Cluster/Ion | | Cluster or ion sputtering | string | 1 | |
| 8.4 | SputterEnergyValue | Sputter energy |eV | Energy of sputter process | number | 1 | |
| 8.5 | SputterTimeValue | Sputter time |s | Duration of the sputtering process | number | 1 | |
| 8.6 | SputterSpot | Spot size of sputtering |µm | Spot size of the sputtering |number|1||
|9 | Handling | Sample handling| | Different types of sample handling | | 0-n | |
|9.1| AngleRes| Angle resolved|°|Incident angle of sample holder to normal|string|1||
|9.2|PressureVar|Pressure variation||Pressure variation (indicate start and end pressure)|string|1||
|9.3|TempVar|Temperature variation|| Temperature variation (indicate start and end temperature)|string|1||
|9.4|otherTreatment|Other Treatment during XPS||Other treatment during the PS measurement|string|1||
| 1.1 | BeamDiameterValue | XPS beam diameter | µm | Beam diameter of the XPS measurement | number | 1 | |
| 1.2 | Tilt | Tilt angle | ° | Tilt angle of measurement | number | 1 | |
| 1.3 | PressureValue | XPS pressure | | Pressure during measurements | string | 1 | |
| 1.4 | Holder | Sample holder | | Which sample holder is used | string | 1 | |
|1.5| AngleRes| Angle resolved|°|Incident angle of sample holder to normal|string|0||
| 2 | SampleID | Sample name | | Number or sample name | string | 1 | |
| 2.1 | FileName | File name | | File name of this measurement | string | 1 | |
| 2.2 | ReceivedCondition | As received condition | | Condition how the sample was received to the XPS chamber (expsoure time) | string | 1 | |
| 2.3 | TemperatureSample | Sample temperature | K | Temperature of the sample during measurement | number | 1 | |
| 2.4 | Neutralize | Neutralization conditions | | Neutralization on/off | boolean | 1 | |
| 2.5 | RepeatNumber | Repeats of measurement | | Number of repeats of the whole measurement setting | number | 0 | |
| 3 | Peak | Peak description| | Description of the peaks | | 1-n | |
| 3.1 | Sample | Sample | | Name of the measured sample (reffering to ID/name of sample from the top) | string | 1-n | |
| 3.2 | PeakName | XPS peak name | | Name of the measured peak including the orbital (e.g. O1s, SURV) | string | 1 | |
| 3.3 | PassEnergy | ValuePass energy | eV | Value of pass energy for FAT | number | 1 | |
| 3.4 | RetardationValue | Retardation ratio | | Retardation ratio (eV) | number | 1 | |
| 3.5 | LowerBE | XPS lower binding energy | eV | Lower Binding energy of measurement | number | 1 | |
| 3.6 | UpperBE | XPS upper binding energy | eV | Upper Binding energy of measurement | number | 1 | |
| 3.7 | AcquisitionTime | Acquisition time | | Total signal accumulation time | number | 1 | |
| 3.8 | StepWidth | XPS step width | eV | Step width of detailed XPS measurement | number | 1 | |
| 3.9 | ScanNumber | Number of scans | | Number of scans for one peak | number | 1 | |
| 3.10 | SampleComment | Comment | | Indicate with any comment specific information about the sample | string | 1 | |
| 4 | Sputtering | Sputtering description| | Description of the sputtering | string| 0| |

0 comments on commit f4f79d6

Please sign in to comment.