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Update XPS_device.md
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MPrenzel authored Feb 7, 2024
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30 changes: 22 additions & 8 deletions dev/diagnostics/spectroscopy/XPS/XPS_device.md
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| 3 | developedBy | Developer | | Name of the company | string | 1 | |
| 4 | AngleSourceValue | Angle between source and analyser | ° | Angle between source and analyser | number | 1 | |
| 5 | Aperture | Aperture of the device | | Aperture of the device | string | 1 | |
| 6 | ReferenceScale | Reference scale | | By giving position and FWHM of a ref material at a reference PE | string | 1| |
| 6 | ReferenceScalePE | Reference scale PE | eV | By giving position and FWHM of a ref material at a reference PE | number | 1 | |
| 6.1 | ReferenceScaleAu | Reference scale Au | eV | By giving position and FWHM of a ref material at a reference Au | number | 1 | |
| 6.2 | ReferenceScaleAg | Reference scale Ag | eV | By giving position and FWHM of a ref material at a reference Ag | number | 1 | |
| 6.3 | ReferenceScaleCu | Reference scale Cu | eV | By giving position and FWHM of a ref material at a reference Cu | number | 1 | |
| 6.4 | ReferenceScaleC | Reference scale C | Ev | By giving position and FWHM of a ref material at a reference C | number | 1 | |
| 7 | Detector | Detector type | | Type and name of the detector | string | 1 | |
| 8 | MaintenanceDate | Last maintenance date | | The date date of maintenance | string | 1 | |
| 9 | IncidentAngle | Incident Angle | ° | Angle to surface normal | number | 1 | |
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| 12 | EmissionCurrent|Emission Current|mA| Emission current of the source|number|1||
|13|PhotonFlux|Photon flux||Photon flux|string|1||
| 14 | Monochromatic | Monochromatized | | monochromatization (yes/no) | boolean | 1 | |
|15 | Resolution | Resolution of the device | | Resolution for device | number | 1 | |
| 16 | AngleSputter | Angle Sputtering | ° | Angle between sputter beam and surface normal | number | 1 | |
| 17 | DwellTimeValue | Dwell time | s | dwell time | number | 1 | |
| 18 | TakeOff | Take off angle | ° | with respect to surface normal | number | 1 | |
| 19 | AnalyserMode | Analyser mode | | Fixed analyser transmission/ Fixed pass energy (FAT) or constant retardation ratio (CRR) |string |1 | |
| 20 | DeviceEquipment | Device equipment | | Device equipment (further sources) | string | 0-1 | |
| 21 | CoolHeat | Cooling or heating | | Is a cooling or heating system installed | string | 0-1 | |
| 15|AnodeVoltageValue|Anode voltage|kV|Voltage at the anode|number|true|15 keV|
|16 | Resolution | Resolution of the device | | Resolution for device | number | 1 | |
| 17 | AngleSputter | Angle Sputtering | ° | Angle between sputter beam and surface normal | number | 1 | |
| 18 | DwellTimeValue | Dwell time | s | dwell time | number | 1 | |
| 19 | TakeOff | Take off angle | ° | with respect to surface normal | number | 1 | |
| 20 | AnalyserMode | Analyser mode | | Fixed analyser transmission/ Fixed pass energy (FAT) or constant retardation ratio (CRR) |string |1 | |
| 21 | DeviceEquipment | Device equipment | | Device equipment (further sources) | string | 0-1 | |
| 22 | CoolHeat | Cooling or heating | | Is a cooling or heating system installed | string | 0-1 | |
|23|NeutralizeType|Neutralization||Neutralization information during measurement|string|1|
|23.1|NeutralizeEnergy|Energy of neutralization|W|Energy of neutralization|number|1|
|24.2|NeutralizeCurrent|Current neutralize|mA|Neutralization current|number|1|
|26|SputterIonName|Gas name||Name of the gas used for sputtering|string|1|Ar, He|
|26.1|Cluster|Cluster/Ion||Cluster or ion sputtering|string|1|
|26.2|SputterSpot|Spot size of sputtering|µm|Spot size of the sputtering |number|1|
|26.3|SputterFluences|Sputtering fluences||Fluences during sputtering|number|1|
|30|TransmissionFunctionFile|Transmission function file||Transmission function file name|string|1|
|30.1|TransmissionFunctionDate|Transmission function date||Date of the measured transmission function|string|1|

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